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EU TendersUltra-high Resolution Electron-beam Lithography System
Call for competition published on TED on 2 Oct 2026 by ETH Zürich - Abt. Procurement & Export Services (Switzerland), CPV 38000000 Laboratory, optical and precision equipments (excl. glasses). Tenders are accepted until 10 Nov 2026.
| Notice | 679334-2026 (cn-standard) |
|---|---|
| Status | Open tender |
| Published | 2 Oct 2026 |
| Buyer | ETH Zürich - Abt. Procurement & Export Services, Zürich |
| Country | Switzerland |
| Main CPV | 38000000-5 Laboratory, optical and precision equipments (excl. glasses) |
| Contract type | supplies |
| Procedure | open |
| Deadline for tenders | 10 Nov 2026 23:58 |
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Description
The B & R Nanotechnology Center (BRNC) at ETH Zurich invites tenders for the purchase of one (1) ultra-high resolution electron-beam lithography (EBL) system. The system will be used for a variety of research activities of internal and external users, ranging from the generation of high-precision structures at the nanometer level to the rapid exposure of complex structures over large areas. The scope includes delivery, installation, training and acceptance of the system.
Lots (1)
| Lot | Title | Estimated value | Deadline |
|---|---|---|---|
| LOT-0000 | Ultra-high Resolution Electron-beam Lithography System | 10 Nov 2026 |
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